Leading Manufacturer for Al2o3 Ceramic Substrate - 99.7% Alumina Wafer Polish Plate – Chemshun

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Leading Manufacturer for Al2o3 Ceramic Substrate - 99.7% Alumina Wafer Polish Plate – Chemshun Detail:

Application

As the Alumina ceramic wafer polishing and sapphire lapping disks used in the semi-conductive, diamond polishing etc.

Process: All types of Polishing and lapping process, such as CMP chemical mechanical polishing, Mechanical Polishing, Precision Polishing.

Feature

High purity and chemical durability
High Mechanical Strength and Hardness
High Corrosion Resistance
High Voltage Resistance
High Temperature Resistant Up to 1700ºC
Extremely Abrasion Resistance Performance
Excellent Insulation Performance
All type of Size 180,360, 450, 600mm etc

Product name	99.7 high purity Alumina ceramic Polishing Lapping Discs
Material	99.7% alumina
Normal Size	D180, 360, 450, 600mm, customized size accepted.
Color	Ivory
Application	Wafer and Sapphire CMP process in semi-conductive industry
Min.Order	1Pic

Chemical / physical Information

		Unit	99.7 Alumina Ceramics
General Properties	Al2O3 content	wt%	99.7-99.9
	Density	gm/cc	3.94-3.97
	Color	-	Ivory
	Water absorption	%	0
Mechanical Properties	Flexural Strength(MOR) 20 ºC	Mpa(psix10^3)	440-550
	Elastic Modulus 20ºC	GPa (psix10^6)	375
	Vickers Hardness	Gpa(kg/mm2) R45N	>=17
	Bending Strength	Gpa	390
	Tensile Strength 25ºC	MPa(psix10^3)	248
	Fracture Toughness (K I c)	Mpa* m^1/2	4-5
Thermal Properities	Thermal conductivity(20ºC)	W/mk	30
	Coefficient of Thermal expansion(25-1000ºC)	1x 10^-6/ºC	7.6
	Thermal Shock Resistance	ºC	200
	Maximum use temperature	ºC	1700
Electrical Properities	Dielectric Strength (1MHz)	ac-kv/mm(ac v/mil)	8.7
	Dielectric Constant(1 MHz)	25ºC	9.7
	Volume Resistivity	ohm-cm (25ºC)	>10^14
		ohm-cm (500ºC)	2×10^12
		ohm-cm (1000ºC)	2×10^7

Service

We accept custom orders.
If you want to know more product information, please feel free contact us and we’ll afford you the most suitable product and best service!

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