Chemshun alumina wafer polishing plate/turn table is made of high purity 99.7-99.9% alumina. High-purity alumina ceramic features outstanding rigidity and excellent wear-resistance for wafer polishing and maintains good surface shape over a long period of time.It is shaped by PIBM. It is a member of the semiconductor industry because of its unparalleled thermal and dimensional stability and resistance to severe microchip processing equipment environments.
Chemical-Mechanical Planarization(CMP), also known as Chemical-Mechanical Polishing, it is a technology in the manufacturing process of semiconductor devices. It uses chemical corrosion and mechanical forces to flatter silicon wafers or other substrate materials during processing.
CMP equipment is mainly divided into two parts: polishing part and cleaning part. The polishing part consists of 4 parts, namely 3 polishing turntables and a wafer loading and unloading module. The cleaning part is responsible for the cleaning and drying of the wafer to achieve the “dry in and dry out” of the wafer. In the entire polishing equipment, alumina ceramics play an important role.
Alumina ceramics are usually used to prepare wafer polishing discs, which require high purity, high chemical durability, and good control of surface shape and roughness.
Chemshun 99.7% Al2O3 ceramic grinding disc is made of advanced ceramic materials, which is suitable for fine grinding of various materials, especially for grinding of brittle materials such as wafers, ceramics and glass. Our ceramic grinding disc can be made into different sizes according to different grinding and polishing models.
Post time: May-30-2025